旋转涂覆

旋转涂覆是一种高速成膜方法，可以得到均匀的薄膜，均匀性广泛应用于半导体材料及化工材料等薄膜制备。它利用旋转产生的离心力，将溶胶、溶液或悬浊液等均匀平铺到衬底表面。[1]

參考文獻
  1. Fundamental understanding and modeling of spin coating process:A review
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